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Semiconductor processes and nanofabrication |
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High-efficiency photo-electron conversion devices Semiconductor processes and nanofabrication Characterizations and applications of nanomaterials Optical characterization of graphene Graphene-gold oxide photodetector Optical analysis of hollow gold nanoparticles Photomodification of hollow gold nanoparticles for high-density data storage Light harvesting and light extraction Light extraction efficiency of LEDs Antireflection structures for solar cells Optical analysis techniques Eco-friendly devices and sensors
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Nano-imprinting in metal (NIM) We describe a thermal embossing imprint method, which we name “nano-imprinting in metal” (NIM), for patterning metal films with a variety of profiles. Metal films exhibiting either perforated hole-arrays or corrugated structures with various surface morphologies can be fabricated rapidly. The SPR phenomenon allowed energy coupling to the other side of the textured metal film, causing a dramatic increase in the transmission. As a technique for readily controlling the working wavelength and transmittance, the NIM method has great potential for application in various optoelectronic devices. |
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FDTD diagrams of a gold film possessing a continuous corrugated structure having a period of 400 nm with 90nm.
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Copyright(c) 2008 Nano-optpelectronics Lab., Department of Material Science and Engineering, National Taiwan University No. 1, Sec. 4, Roosevelt Road, Taipei, 10617 Taiwan(R.O.C) Phone：+886-2-3366-3240 Fax：+886-2-2362-7651 |
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