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莫忘初衷
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姓名 |
劉穎 |
工作內容 |
金屬玻璃 |
興趣 |
火舞 |
E-mail |
r05527006@ntu.edu.tw |
目前現況 |
已畢業 |
Publications:
- Y. Liu, Y. S. Chang, Y. J. Hsu, B. J. Hwang, and C. H. Hsueh, “Fabrication of WO3 photoanode decorated with Au nanoplates and its enhanced photoelectrochemical properties,” Electrochim. Acta, 321, 134674 (2019).
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我喜歡穩定且規律的生活, 但卻又渴望可以自由安排, 會將該做的事通通記錄在月曆上, 以確保自己可以準時,但也討厭別人遲到。 我的成就感來自於完成,
習慣將一切的待辦事項列成清單,一項項完成以獲得成就感,就像從大三到碩一的研究題目一樣,從記憶合金到光觸媒又到太陽能電池,卻不會因此感到疲憊,反而是想把所學通通融合,看看是否有新花樣。我愛吃,也愛運動,但大四畢業後體重直線上升,希望不要因為研究生活而越變越胖,也期許在未來自己可以保持運動習慣,不要因為趕進度而讓身體變差了。
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姓名 |
林 宥 庚 |
工作內容 |
太陽能電池 |
興趣 |
打排球,吃美食,逛夜市 |
E-mail |
qoolinboy@gmail.com |
目前現況 |
已畢業 |
Publications:
- Y. K. Lin, Y. S. Chen, and C. H. Hsueh, “Combined Metal-Assisted Chemical Etching and Anisotropic Wet Etching for Anti-Reflection Inverted Pyramidal Cavities on Dendrite-like Textured Substrates,” Results Phys., 12, 244–249 (2019).
- Y. K. Lin, Y. T. Hong, J. J. Shyue, and C. H. Hsueh, “Construction of Schottky Junction Solar Cell Using Silicon Nanowires and Multi-layered Graphene,” Superlattices Microstruct., 126, 42–48 (2019).
- H. F. Ou, Y. K. Lin, and C. H. Hsueh. “Structural and Optical Properties of Textured Silicon Substrates by Three-Step Chemical Etching,” Langmuir, 37, 9622–9629 (2021).
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Color is my daily obsession,
my joy and my torment.
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姓名 |
陳嬿昕 |
工作內容 |
光觸媒 |
興趣 |
旅遊、水上活動、騎車到處玩
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E-mail |
r05527049@ntu.edu.tw
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目前現況 |
已畢業
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Publications:
- Y. S. Chen, B. K. Chao, T. Nagao, and C. H. Hsueh, “Effects of Ag Particle Geometry on Photocatalytic Performance of Ag/TiO2/Reduced Graphene Oxide Ternary Systems,” Mater. Chem. Phys., 240, 122216 (2020).
- Y. K. Lin, Y. S. Chen, and C. H. Hsueh, “Combined Metal-Assisted Chemical Etching and Anisotropic Wet Etching for Anti-Reflection Inverted Pyramidal Cavities on Dendrite-like Textured Substrates,” Results Phys., 12, 244–249 (2019).
- Y. S. Chen, H. C. Ho, Y. C. Lai, T. Nagao, and C. H. Hsueh, “Thermochromic vanadium dioxide film on textured silica substrate for smart window with enhanced visible transmittance and tunable infrared radiation,” Infrared Phys. Technol., 102, 103019 (2019).
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